Supply of a Plasma Etch Tool for Silicon Carbide (SiC) Etching

Concepts

• silicon carbide
• swansea
• precision equipment
• supply of a plasma etch tool
• delivery of a plasma etch tool
• new tool
• deposition tool set
• sic
• plasma
• etch capability

Location

Wales: to be delivered to Newport Wafer Fab

Description

This Tender Specification is for the supply and delivery of a Plasma Etch Tool for SiC etching. In procuring this system, the University is seeking to augment its well-established existing plasma etch and deposition tool set, expanding the capabilities that the CISM will be able to provide. The new tool will be of strategic importance in delivering both frontside SiC etch capability for power MOSFET trench applications, and backside SiC via etch capability for GaN-on-SiC device applications. Reliability of the equipment is therefore paramount to maintaining, supporting and complimenting the wide array of experimental work that will be conducted within the facility.

Total Quantity or Scope

Additional information: Funding for this procurement has been secured from the Driving the Electric Revolution (DER) Industrialisation Centres Programme via Innovate UK.

Award Detail

Award Criteria

CPV Codes

• 38000000 - Laboratory, optical and precision equipments (excl. glasses)
• 38900000 - Miscellaneous evaluation or testing instruments
• 38970000 - Research, testing and scientific technical simulator
• 39180000 - Laboratory furniture

Other Information

** PREVIEW NOTICE, please check Find a Tender for full details. ** (WA Ref:111656)