Deposition Tools

Concepts

• cardiff
• precision equipment
• requirement of the plasma etch tools
• requirement of the pecvd tool
• deposition tools
• icp plasma etch system
• high density plasma
• etching iii-v materials
• laboratory and optical equipment
• load lock

Location

Cardiff

Description

- An ICP Plasma Etch system, with load lock, for etching III-V materials to shallow or standard (<10um) etch depths, and be capable of etching the following materials GaAs, GaN, InP, InSb/GaSb, SixNy, BCB and Polyimide - A High Density Plasma Etch system designed to etch strongly bonded materials, with load lock, capable of etching strongly bonded materials including SiO2 (>100um), Glass, SiNx,, SiC, GaN, PZT and AlN and Al2O3. Must operate with higher plasma density and at lower pressures than conventional ICP systems.

Total Quantity or Scope

The requirement of the Plasma ETCH tools is to etch III-V semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers. The requirement of the PECVD tool is to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers. The supplier must provide all 3 systems, to criteria set out below, for the bid to be successful. Specification of Equipment An ICP Plasma Etch system, with load lock, for etching III-V materials to shallow or standard (<10um) etch depths, and be capable of etching the following materials GaAs, GaN, InP, InSb/GaSb, SixNy, BCB and Polyimide A High Density Plasma Etch system designed to etch strongly bonded materials, with load lock, capable of etching strongly bonded materials including SiO2 (>100um), Glass, SiNx,, SiC, GaN, PZT and AlN and Al2O3. Must operate with higher plasma density and at lower pressures than conventional ICP systems.

Award Criteria

CPV Codes

• 38000000 - Laboratory, optical and precision equipments (excl. glasses)

Indicators

• Bids should cover the whole contract.
• Renewals are not available.
• Award on basis of price and quality.

Other Information

(WA Ref:117762)