202122/547 Supply of up to four dry etch and deposition systems

Concepts

• dry etching equipment
• leeds
• university of leeds
• high-density plasma
• chemical vapour deposition system
• dry etch
• deposition systems
• deep-silicon reactive ion etcher
• parallel plate rie
• d-rie

Location

Description

The University of Leeds is seeking tenders for four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)

CPV Codes

• 22520000 - Dry-etching equipment

Other Information

Please follow this link to view the notice https://www.delta-esourcing.com/tenders/UK-UK-Leeds:-Dry-etching-equipment./ZA5C...