Large Scale Photolithography Spray Coater

Concepts

• enclosed spray coating system
• cardiff
• precision equipment
• large scale photolithography spray coater
• physical proof of capability
• flexible polypropylene substrates
• laboratory and optical equipment
• thickness of the photoresist
• coating ring
• standard silicon wafer substrates

Location

Cardiff

Description

A stand-alone, fully-enclosed spray coating system for coating ring mounted flexible polypropylene substrates with photoresist over a diameter of 900mm. The thickness of the photoresist should be uniform to within 100nm over the full substrate area but should also be variable between 500nm and 1800nm. Physical proof of capability will be required for either Shipley S1813 photoresist or AZ P4110. The flexible substrate would typically be 25um polypropylene and be supported on an aluminium ring. The system should also be able to coat standard silicon wafer substrates or quartz to the same uniformity.

Award Detail

Award Criteria

CPV Codes

• 38000000 - Laboratory, optical and precision equipments (excl. glasses)

Indicators

• Award on basis of price and quality.

Legal Justification

Cardiff University have two weeks installation and commissioning of the system when it arrives, two weeks of manufacturing of the components and two weeks of testing, the University needs to reduce the timescale for this requirement by using the accelerated open procedure,it is already an almost impossible schedule as it stands, if we were to conduct the exercise using the usual 30 day open procedure it would have a negative impact on the Project.

Other Information

(WA Ref:121316)