Dry Based Chemical Absorption III-V Gas Abatement System (x two)

Concepts

• sheffield
• electrical equipment and apparatus
• epsrc national epitaxy facility
• gas abatement systems
• new dry-chemical absorption
• abatement system
• system pump
• output of the abatement system
• dry based chemical absorption iii-v gas abatement system
• wide range of iii-v semiconductor materials

Location

The University of Sheffield — Department of Electronic and Electrical Engineering

Description

The EPSRC National Epitaxy Facility (NEF) at the University of Sheffield supplies a wide range of III-V semiconductor materials primarily to the UK academic research community by the means of the MOVPE (MOCVD) process. The NEF also engages in significant activity researching and developing new materials and structures. The NEF requires two new dry-chemical absorption-based gas abatement systems for scrubbing process gases carried by hydrogen to the abatement system by a system pump. The system must be able to remove all hazardous materials efficiently and safely from the process tool ensuring the safety of personnel and in compliance with regulatory emission standards at the output of the abatement system.

Award Detail

Renewal Options

As described within the tender documents.

Award Criteria

CPV Codes

• 31600000 - Electrical equipment and apparatus

Indicators

• Options are available.
• Award on basis of price and quality.