Dry Based Chemical Absorption III-V Gas Abatement System (x two)

A Contract Award Notice
by THE UNIVERSITY OF SHEFFIELD

Source
OJEU
Type
Contract (Supply)
Duration
2 month (est.)
Value
£212K
Sector
INDUSTRIAL
Published
12 Feb 2021
Delivery
29 Jan 2021 to 31 Mar 2021 (est.)
Deadline
n/a

Concepts

Location

The University of Sheffield — Department of Electronic and Electrical Engineering

Geochart for 3 buyers and 1 suppliers

3 buyers

1 supplier

Description

The EPSRC National Epitaxy Facility (NEF) at the University of Sheffield supplies a wide range of III-V semiconductor materials primarily to the UK academic research community by the means of the MOVPE (MOCVD) process. The NEF also engages in significant activity researching and developing new materials and structures. The NEF requires two new dry-chemical absorption-based gas abatement systems for scrubbing process gases carried by hydrogen to the abatement system by a system pump. The system must be able to remove all hazardous materials efficiently and safely from the process tool ensuring the safety of personnel and in compliance with regulatory emission standards at the output of the abatement system.

Award Detail

1 CS Clean Systems (Coventry)
  • Dry Based Chemical Absorption III-V Gas Abatement System (x two)
  • Reference: 2736/dm
  • Num offers: 1
  • Value: £211,979
  • Contractor is an SME.

Renewal Options

As described within the tender documents.

Award Criteria

Quality (4 categories) 80.0
PRICE 20.0

CPV Codes

  • 31600000 - Electrical equipment and apparatus

Indicators

  • Options are available.
  • Award on basis of price and quality.

Reference

Domains