PECVD Plasma Deposition Tool

A Tender Notice
by CARDIFF UNIVERSITY

Source
OJEU
Type
Contract (Supply)
Duration
0.5 year
Value
___
Sector
INDUSTRIAL
Published
22 Dec 2021
Delivery
To 30 Sep 2022 (est.)
Deadline
07 Feb 2022 12:00

Concepts

Location

Cardiff

Geochart for 2 buyers and 0 suppliers

2 buyers

Description

A new PECVD plasma deposition tool for use within the ICS cleanroom to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers.

Total Quantity or Scope

The requirement of the tool is to deposit films of dielectric materials onto semiconductor samples, wafers and other substrates, ranging in size from 10 x 10 mm up to 200mm diameter wafers.

CPV Codes

  • 38000000 - Laboratory, optical and precision equipments (excl. glasses)

Indicators

  • Bids should cover the whole contract.
  • Renewals are not available.
  • Award on basis of price and quality.

Other Information

(WA Ref:116928)

Reference

Domains