202122/547 Supply of up to four dry etch and deposition systems

Concepts

• dry etching equipment
• leeds
• university of leeds
• high-density plasma
• chemical vapour deposition system
• deposition systems
• dry etch
• deep-silicon reactive ion etcher
• hdp-cvd
• parallel plate rie

Location

Leeds

Description

The University of Leeds is seeking tenders for four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)

Total Quantity or Scope

•A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD) Additional information: To respond to this opportunity please click here: https://neupc.delta-esourcing.com/respond/ZA5CH77BT9

CPV Codes

• 22520000 - Dry-etching equipment

Indicators

• This is a one-off contract (no recurrence)
• Renewals are not available.

Other Information

** PREVIEW NOTICE, please check Find a Tender for full details. ** For more information about this opportunity, please visit the Delta eSourcing portal at: https://neupc.delta-esourcing.com/tenders/UK-UK-Leeds:-Dry-etching-equipment./ZA... To respond to this opportunity, please click here: https://neupc.delta-esourcing.com/respond/ZA5CH77BT9 GO Reference: GO-2022215-PRO-19654546