Supply of one off Reactive Ion Etcher (RIE) and/or a one off Inductively Coupled Plasma Reactive Ion Etcher (ICPRIE) in two lots

A Tender Notice
by UNIVERSITY OF SHEFFIELD

Source
Find a Tender
Type
Contract (Supply)
Duration
8 month
Value
300K
Sector
INDUSTRIAL
Published
27 May 2022
Delivery
04 Jul 2022 to 28 Feb 2023
Deadline
28 Jun 2022 12:00

Concepts

Location

The Department of Electronic and Electrical Engineering at the University of Sheffield

Geochart for 2 buyers and 0 suppliers

2 buyers

Description

The Device Fabrication Small Research Facility (SRF) currently has one reactive ion etcher (RIE) and two inductively coupled plasma reactive ion etchers (ICPRIE), serving a wide range of research and industrial customers from across the University and nationally. The SRF is capable of manufacturing semiconductor devices via a range of standard processes, working alongside our Epitaxy facility growing advanced semiconductor materials. Our research portfolio in these areas is in excess of £50million. Quotations are required for 1 off of each RIE and ICP, in two separate lots, with the specifications detailed within the tender document. As present the likelihood is that only one item will be purchased, hence the title of this exercise being on an and/or basis.

Total Quantity or Scope

The RIE and ICP equipment is fundamental to device fabrication, and we are planning to expand our capacity to meet increasing demand and to improve customer service. The anticipated budget for each item is: RIE £300,000 (excluding VAT) ICPRIE £233,333 (excluding VAT)

Renewal Options

As described within the tender documents

CPV Codes

  • 38000000 - Laboratory, optical and precision equipments (excl. glasses)
  • 42000000 - Industrial machinery

Indicators

  • Bids should cover the whole contract.
  • Options are available.
  • Renewals are not available.
  • Award on basis of price and quality.

Other Information

This tender is designed to seek response for the purchase of a Reactive Ion Etcher (RIE) or, a one off Inductively Coupled Plasma Reactive Ion Etcher (ICPRIE) and it is highly unlikely that we will be in a position to purchase both items.

Reference

Domains