3674/JN - Atomic Layer Deposition (ALD) System

Concepts

• sheffield
• precision equipment
• department of physics and astronomy
• atomic layer deposition
• growth of ultra-thin layers of metal oxides
• jn - atomic layer deposition
• predominant use of this system
• ald
• metal oxide layers
• deposition

Location

Description

The Department of Physics and Astronomy at The University of Sheffield, requires an atomic layer deposition (ALD) system for the growth of ultra-thin layers of metal oxides on substrates for use in a range of optoelectronic devices. The system needs to be capable of depositing a range of metal oxides (in particular Al2O3, TiO2, SnOx and InOx) onto substrates which are placed on a sample holder with a circular diameter of ~150mm. The predominant use of this system will be to deposit metal oxide layers within metal halide perovskite semiconductor devices. This requires a system which can ensure substrates are held at various temperatures ranging from 50°C to 200°C during deposition. This system shall be used to deposit thin films on substrates of different textures. Therefore, conformality of the resultant films is a key requirement. The instrument needs to be a tabletop instrument and must be cleanroom compatible.

Award Detail

CPV Codes

• 38000000 - Laboratory, optical and precision equipments (excl. glasses)

Indicators

• Contract is suitable for SMEs.
• Contract is suitable for VCOs.

Other Information

This is an open exercise. The ITT can be downloaded by registering and expressing your interest on the University`s e-tendering system https://in-tendhost.co.uk/sheffield If you have any questions or comments in relation to this tender they must be submitted via the In-tend system, this can be accessed at https://in-tendhost.co.uk/sheffield Completed tenders must be returned through the same e-tendering system. All tender documents can be accessed at https://in-tendhost.co.uk/sheffield